Publikace
- Preparation of Metal Oxides Thin Films by Hollow Cathode Plasma Jet2022 | Matematicko-fyzikální fakulta
- Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges2023 | Ústřední knihovna
- Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films2023 | Matematicko-fyzikální fakulta
- Nickel-Copper Oxide Catalysts Deposited on Stainless Steel Meshes by Plasma Jet Sputtering: Comparison with Granular Analogues and Synergistic Effect in VOC Oxidation2023 | Matematicko-fyzikální fakulta
- Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths2023 | Matematicko-fyzikální fakulta
- Diagnostics of Reactive HiPIMS Discharge Assisted by ECWR Plasma2021 | Matematicko-fyzikální fakulta
- Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture2020 | Matematicko-fyzikální fakulta
- Diagnostics of Surfatron-generated Plasma in PE-ALD Deposition System2020 | Matematicko-fyzikální fakulta
- Registration of a Laser Beam Scattered from an Aerosol Located in the Probe Beam Aperture2019 | Matematicko-fyzikální fakulta
- Particularities of Cu and Zn Nanoparticles Formation in a Magnetic Field2019 | Matematicko-fyzikální fakulta
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