Classes
Publications
- Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering2012 | Faculty of Mathematics and Physics
- Highly ionized physical vapor deposition plasma source working at very low pressure2012 | Faculty of Mathematics and Physics
- Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma2012 | Faculty of Mathematics and Physics
- Ti/TiO2 Thin Films Deposition by Means of Hollow Cathode Plasma Jet2012 | Faculty of Mathematics and Physics
- Energy Resolved Ion Mass Spectroscopy of the Pulsed Magnetron Discharge2012 | Faculty of Mathematics and Physics
- Langmuir probe study of a magnetically enhanced RF plasma source at pressures below 0.1 Pa2011 | Faculty of Mathematics and Physics
- Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges2011 | Faculty of Mathematics and Physics
- Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti-Cu thin films2010 | Faculty of Mathematics and Physics
- Effect of nitrogen doping on TiOxNy thin film formation at reactive high-power pulsed magnetron sputtering2010 | Faculty of Mathematics and Physics
- Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system2010 | Faculty of Mathematics and Physics
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