Předměty
Publikace
- Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering2012 | Matematicko-fyzikální fakulta
- Highly ionized physical vapor deposition plasma source working at very low pressure2012 | Matematicko-fyzikální fakulta
- Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma2012 | Matematicko-fyzikální fakulta
- Ti/TiO2 Thin Films Deposition by Means of Hollow Cathode Plasma Jet2012 | Matematicko-fyzikální fakulta
- Energy Resolved Ion Mass Spectroscopy of the Pulsed Magnetron Discharge2012 | Matematicko-fyzikální fakulta
- Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system2011 | Matematicko-fyzikální fakulta
- Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges2011 | Matematicko-fyzikální fakulta
- Time-Resolved Diagnostics of Dual High Power Impulse Magnetron Sputtering With Pulse Delays of 15 us and 500 us2011 | Matematicko-fyzikální fakulta
- Study of Plasma System by OES (Optical Emission Spectroscopy)2011 | Matematicko-fyzikální fakulta
- Measurement of the Gas Flow Velocity in the Low Pressure Hollow Cathode Plasma Jet Sputtering System2011 | Matematicko-fyzikální fakulta
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