Publikace na Matematicko-fyzikální fakulta |
2012
Abstrakt
Hollow cathode plasma jet (HCPJ) sputtering technique, history and comparisons with another plasma sources are reviewed in this article. Properties, characteristics and deposition features of the Ti and TixOy films are considered.
The approach of quartz crystal microbalance (QCM) usage and calibration is shown. First results of Ti/TiO2 thin films deposited on Si substrate are presented in the end.