Abstrakt
Research into nanostructured thin films of plasma polymers is driven by applications of these materials in a wide variety of fields. Here, we review work on the preparation of such coatings using low-pressure discharges, with a focus on the different strategies employed.
We start with nanostructured plasma polymers prepared by plasma polymerization under special conditions such as at a large distance from the plasma zone and at a high working gas pressure. Then, methods based upon plasma etching and colloidal lithography combined with plasma treatment are described.
Finally, dusty plasmas and gas aggregation cluster sources with planar magnetrons are considered for generation of nanoclusters, nanoparticles, and for deposition of nanostructured plasma polymer films.