Publication at Faculty of Mathematics and Physics |
2014
Abstract
TiO2 nanoparticles have been investigated in this work. Nanoparticles were obtained in Ar plasma on monocrystaline Si(111) substrate by means of gas-phase deposition using hollow cathode plasma jet (HCPJ).
Oxygen was introduced separately from argon through inlet in a chamber. The material of a cathode is pure titanium.
The explanation of nanoparticles growth mechanism is given. Morphology of thin films surface was investigated by the atomic force microscope (AFM).
A chemical composition of the thin films was investigated by means of energy-dispersive x-ray analysis (EDX).