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Effect of implantation of C, Si, and Cu into ZrNb nanometric multilayers

Publikace na Matematicko-fyzikální fakulta |
2019

Tento text není v aktuálním jazyce dostupný. Zobrazuje se verze "en".Abstrakt

Sputter-deposited Zr/Nb nanometric multilayer films with a periodicity (L) in the range from 6 to 167 nm were subjected to carbon, silicon and copper ion irradiation with low and high fluences at room temperature.