Boron-Doped Diamond Microelectrodes Fabricated by Microwave Plasma Enhanced Chemical Vapour Deposition Process with Linear Antenna Delivery
Abstrakt
In this work, boron-doped diamond microelectrodes (BDDμE) were fabricated using a linear antenna microwave plasma enhanced chemical vapour deposition process (MW-LA-PECVD). To observe the surface morphology and estimate the thickness of deposited BDD layers, scanning electron microscopy was used.
It revealed incomplete coverage of BDD on the tungsten wires (20 µm diameter) used as a substrate. Comparison of electrochemical behaviour of the BDDμE with complete and incomplete BDD coverage was performed by cyclic voltammetry in different supporting electrolytes evaluating the widths of the potential windows.
The reversibility of the electron transfer for the outer-sphere [Ru(NH3)6](3+/2+) and inner-sphere [Fe(CN)6](3-/4-) redox markers and the effective surface area were experimentally assessed.