Chemical-Mechanical Polishing of CdTe and Zn(x)Cd(1-x)Te Single Crystals by H2O2(HNO3)-HBr-Organic Solvent Etchant Compositions

Abstract

Chemical-mechanical polishing of CdTe and Zn(x)Cd(1-x)Te single-crystal surfaces by bromine-evolving compositions based on aqueous solutions of H2O2(HNO3)-HBr-solvent has been investigated. The dependences of the chemical-mechanical polishing rate on the dilution of the base polishing etchant for various organic components have been determined.

The surface condition after such polishing has been investigated using profilometry.

Keywords

• Chemical-Mechanical
• Polishing
• Single
• Crystals
• -HBr-Organic
• Solvent
• Etchant
• Compositions