Publication at Faculty of Mathematics and Physics |
2009
Abstract
The thermally activated Ti-Zr-V non-evaporable getter (NEG) film has been studied by means of X-ray photoelectron spectroscopy and low energy ion scattering. Depth profiling technique has been used to establish the location of different components in the near-surface region.
Residual oxide observed even on fully activated NEG surface consists mostly of zirconium and titanium low valence suboxides that are located mainly in the top surface layer. Carbides formed during the activation process remain on the surface and their concentration drops strongly with depth.