- Diagnostics of Reactive HiPIMS Discharge Assisted by ECWR Plasma2021 | Matematicko-fyzikální fakulta
- Highly ionized physical vapor deposition plasma source working at very low pressure2012 | Matematicko-fyzikální fakulta
- Time-resolved Langmuir probe investigation of hybrid high power impulse magnetron sputtering discharges2013 | Matematicko-fyzikální fakulta
- Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges2011 | Matematicko-fyzikální fakulta
- Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges2023 | Ústřední knihovna